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Our mission is to empowers businesses off all size in an businesses.
INE-3085是一款高密度ICP刻蚀系统，支持6/8英寸晶圆。采用高密度ISM上电极，产生高密度等离子体，刻蚀速率快，均匀性好。适用于Si、SiO2、Si3N4、光刻胶等多种材料刻蚀。
微纳加工、MEMS器件研发、半导体器件制造
Our mission is to empowers businesses off all size in an businesses.
