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NE-550真空干法等离子刻蚀设备采用负载锁定式自动传样设计，一体化机身结构。选用ISM上电极，产生高密度等离子体，刻蚀效果优异。可搭载ESC静电吸附，实现基片均匀冷却。兼容2-8英寸样片，最大支持8路工艺气路，适用于各类金属膜层或介质膜层刻蚀。
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Our mission is to empowers businesses off all size in an businesses.
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