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Our mission is to empowers businesses off all size in an businesses.
Orbis释放刻蚀系统专为MEMS器件的牺牲层释放刻蚀设计。采用特殊的反应腔体设计，确保释放过程的安全性和均匀性。支持XeF2、HF蒸汽等多种刻蚀气体。
MEMS器件制造、微结构释放、传感器开发
Our mission is to empowers businesses off all size in an businesses.
