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INE-3085 ICP刻蚀系统

Home > Projects > INE-...

高密度ICP刻蚀系统，支持8英寸晶圆

INE-3085是一款高密度ICP刻蚀系统，支持6/8英寸晶圆。采用高密度ISM上电极，产生高密度等离子体，刻蚀速率快，均匀性好。适用于Si、SiO2、Si3N4、光刻胶等多种材料刻蚀。

应用领域：

微纳加工、MEMS器件研发、半导体器件制造

核心特点

  • 支持6/8英寸晶圆
  • 高密度ICP等离子体源
  • 快速刻蚀速率
  • 优异的刻蚀均匀性
  • 多功能材料刻蚀能力
  • 自动化控制系统
产品信息
  • 品牌 ULVAC
  • 型号 INE-3085
  • 类别 干法刻蚀
  • 领域 微纳加工、MEMS、半导体

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