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scia mill 200 离子束刻蚀系统

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离子束刻蚀系统，高精度微纳加工

SCIA Mill 200离子束刻蚀系统采用射频离子源，提供高精度的离子束刻蚀。适用于各种材料的微纳加工，刻蚀过程无化学残留，纯物理刻蚀。

应用领域：

微纳加工、光学器件制造、传感器开发

核心特点

  • 射频离子束源
  • 高精度刻蚀控制
  • 无化学残留
  • 适用于多种材料
  • 均匀的离子束分布
  • 实时过程监控
产品信息
  • 品牌 ULVAC
  • 型号 SCIA Mill 200
  • 类别 离子束刻蚀
  • 领域 微纳加工、光学器件

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