等离子刻蚀设备

用于研发的高密度等离子刻蚀设备采用了磁场ICP的工艺方法，单晶片处理类型的LL室作为标准设备，空间占用很小，操作简单，应用效率高。

NE550EX is a multipurpose high-density plasma etching system, especially for test facilities such as universities and government agencies.

Features

√ Equip with low-pressure, low-electron-temperature and high-density plasma source.

√ Supports wide range of process control from ion etching to radical etching.

√ Plasma density and uniformity can be controlled by optimizing magnetic field.

√ Simple configuration makes maintenance easy.

Applications

√ Ultra-high frequency devices, optical devices (LEDs, LDs)

√ Next-generation non-volatile memory

√ Biochips and microfluid devices

√ Photonic crystals

√ Sensors, MEMS (micro-electromechanical systems)

Specifications