ULVAC CC-200等离子化学气相沉积设备结构紧凑，使用方便，符合工艺研发和大批量生产的要求。

C-200 is a compact and easy-to-use system for R&D use and production.

装置结构示意图

产品特性Features

√ High-density plasma process on 27.12MHz

√ Supports the deposition of SiH4 (SiO2, SiNx, SiON, a-Si ) and TEOS (SiO2).

√ Supports the chamber cleaning by CF4+O2 plasma.

√ Supports the heater for low-temperature deposition of organic EL.

√ Supports various substrate sizes.

√ Vacuum box-enabled indirect sequential processing within C-series (Sputter: CS-200, Evaporation: CV-200).

产品应用Applications

√ Power devices

√ Compound-related devices of LED, LD and highspeed devices

√ Organic EL system for R&D use

√ Solar battery system for R&D use

√ MEMS

设备构成概览